ASML expects its high-NA EUV lithography systems to reach high-volume manufacturing readiness by the end of 2026. Greet Storms, head of high-NA product management, announced the timeline at Semicon Taiwan 2026.
The company targets 90% fleet availability by the fourth quarter of 2026. This metric serves as a critical benchmark for customers planning future chip production roadmaps.
ASML’s EXE:5200B system already meets essential imaging and productivity specifications. This technology enables the manufacturing of smaller, more powerful next-generation semiconductors.
Reaching production-grade availability solidifies ASML’s technological leadership. These milestones underpin future revenue streams from the company's most advanced lithography machines.