The Dutch government has formally objected to the proposed US Match Act, which seeks to further restrict ASML's semiconductor equipment sales to China. The legislation would prohibit the company from selling lower-end deep ultraviolet (DUV) lithography systems and servicing existing equipment within the country.
The proposed law marks a significant escalation of current US export controls. Existing regulations already prevent ASML from exporting its most advanced extreme ultraviolet (EUV) machines to Chinese firms.
The Hague cited extraterritorial concerns in its objection to the bill. This development introduces heightened geopolitical and regulatory uncertainty for ASML, which identifies China as a critical market for its lithography technology.